3D shape laser exposure device *under development*
Achieving maskless photolithography for three-dimensional shapes through 5-axis stage control!
The "3D Shape Laser Exposure Device" enables fine patterning on various shapes through a 5-axis stage configuration (3 linear axes and 2 rotational axes). Since it performs direct exposure using a semiconductor laser, there is no need for a metal mask, contributing to reduced research and development time and budget. Additionally, it can read data created in 2D and 3D CAD using dedicated conversion software. 【Features】 ■ 5-axis stage configuration (3 linear axes and 2 rotational axes) ■ Capable of fine patterning on various shapes ■ No need for a metal mask, contributing to reduced research and development time and budget ■ Can read data created in 2D and 3D CAD using dedicated conversion software ■ Easy alignment of three-dimensional structural samples with the alignment assistance mechanism *For more details, please refer to the PDF document or feel free to contact us.
- Company：ネオアーク 東京営業部
- Price：Other
